Eitre 8


The EITRE® 8 Nano Imprint Lithography (NIL) Systems provide a manual and affordable lithography solution that enable pattern replication both in the micro- and nanometer range. The embedded SoftPress® technology is vital as it provide excellent residual layer thickness control across the entire imprint area and allowing an accurate pattern transfer.

The system is also very versatile as it can be configured for a variety of imprint processes to be used including hot embossing, UV NIL,thermal NIL and Obducat’s unique Simultaneous Thermal and UV (STU®) process.

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  • Full area imprint
  • Softpress® technology
  • User-friendly interface
  • Multiple imprint process capability
  • Wide range of configuration possibilities
  • Sub-20nm residual layer thickness

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