NANOIMPRINT LITHOGRAPHY


Obducat provides viable and cost-effective lithography and wet processing solutions that will give a competitive edge to our customers, enabling them to deliver break-through applications and achieve improved profitability and success.

Obducat's products can be divided into two groups based on the underlying technology platform; Nanoimprint Lithography (NIL) and the Wet Processing systems.



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Nanoimprint Lithography Product


Eitre 3

The EITRE® 3 systems are very versatile tools for areas in solid-state lighting, micro optical and photonic components, patterned media, bio-medical and life science, lab-o-chip, MEMS/NEMS and semiconductors.

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Eitre 6

The EITRE® 6 Nano Imprint Lithography (NIL) Systems provide a manual and affordable lithography solution that enable pattern replication both in the micro- and nanometer range.

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Eitre 8

The EITRE® 8 Nano Imprint Lithography (NIL) Systems provide a manual and affordable lithography solution that enable pattern replication both in the micro- and nanometer range.

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Sindre 600

The fully automated Sindre® imprint platform is an extension to the Obducat's NIL product family.

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