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Sindre 600
The fully automated Sindre® imprint platform is an extension to the Obducat's NIL product family. The Sindre platform allows a consistent, reliable and high throughput manufacturing solution combining high resolution and CD-control with high yield.
The Sindre® platform encompass a comprehensive nanolithography solution combiningboth machine and process technology to ensure costefficient production. The Sindre® HVM system can be applied to several application areas such as OLED, LED, MEMS/NEMS (Micro/Nano Electromechanical System), Display and HDD, etc.
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- Engineered for high reliability and low maintenance cost.
- High yield and throughput performance result in more efficient total cost of ownership.
- Softpress® ensures imprint uniformity all the way to the edges of the substrate, without the need of any planarization layers.
- IPS® increase stamp lifetime and eliminates the risk of substrate breakage.
- Simple up– and downstream processing. no need for additional adhesive pre-coating of substrates or any complex and expensive post-process spin-on etch layers.
The SINDRE® Nano Imprint Lithography (NIL) systems are configured for fully automated high volume production, using Obducat's proprietary IPS®/STU® process.
Both cost efficiency and contamination control are achieved via hands-off operation and a superior cassette-to-cassette operating protocol. The standard configuration can achieve a throughput of 30 wafers per hour.
| Imprint Area | Up to 6" |
| Throughput | 30 wph |
| Clean-room Compatibility | Class 100 |
| Mini Environment | Class 10 |
| Substrate Handling | Cassette-to-casette |
| Computer controlled user interface | Standard |
| STU® | Standard |
| IPS® | Standard |